Setyr worked example — PE-2200 Etch Chamber A — Wet Clean Isolation Not approved for use. Version 1 · 2026-09-04
Worked example only — your site must author, review and approve its own
procedure under 29 CFR 1910.147(c)(4). setyr.com/procedures
PE-2200 Etch Chamber A — Wet Clean Isolation
Semiconductor
Full energy isolation of plasma etch chamber A for scheduled chamber wet clean. Cl2/BCl3 metal etch chemistry.
This is a worked example, not a procedure you can adopt. It describes equipment that does not exist, with illustrative tag numbers.
29 CFR 1910.147(c)(4) requires the employer to develop, document and
utilise energy control procedures specific to their own machines, and (c)(6)
requires the employer to inspect those procedures periodically. Neither duty
can be delegated to a vendor or discharged by this document.
Isolation points
| # | Tag (illustrative) | Type | Disposition | What it does and why | Dwell |
|---|---|---|---|---|---|
| 10 | ETCH-A-CL2-VMB | Valve | Isolate & lock | Chlorine (Cl2) process gas manual valve at the valve manifold box. TOXIC gas; purge required before break. | — |
| 30 | ETCH-A-BCL3-VMB | Valve | Isolate & lock | Boron trichloride (BCl3) manual valve at the valve manifold box. TOXIC/corrosive; purge required. | — |
| 40 | ETCH-A-N2-PURGE | Valve | Isolate & lock | N2 purge valve for process gas lines. Used DURING isolation to purge toxics; not isolated for the work. | — |
| 60 | ETCH-A-VAC-ISO | Valve | Isolate & lock | Chamber vacuum isolation valve to the roughing pump. Vacuum/pressure energy. | — |
| 70 | ETCH-A-RF-DISC | Disconnect | Isolate & lock | RF generator supply disconnect (13.56 MHz). Electrical + STORED capacitor energy; requires discharge dwell. | — |
| 90 | ETCH-A-MAIN-DISC | Disconnect | Isolate & lock | Tool main electrical disconnect, 480V 3ph at the facility panel. Electrical energy. | — |
| 100 | ETCH-A-CDA | Valve | Isolate & lock | Compressed dry air supply to pneumatic valves and wafer handler. Pneumatic energy. | — |
| 110 | ETCH-A-CDA-BLEED | Bleed | Isolate & lock | CDA bleed to atmosphere downstream of the supply valve. Relieves stored pneumatic pressure. | — |
| 120 | ETCH-A-PCW-SUP | Valve | Isolate & lock | Process cooling water supply to chuck and chamber walls. Hydraulic + thermal. | — |
| 130 | ETCH-A-PCW-RET | Valve | Isolate & lock | Process cooling water return. Hydraulic + thermal. | — |
What your site must supply
- Your own asset and isolation-point tag numbers. The tags shown are illustrative and refer to equipment that does not exist.
- The actual location of every disconnect, valve and vent on your equipment.
- Measured stored-energy magnitudes and the dwell time required to dissipate them.
- Your verification method for each point, and who is authorised to perform it.
- Any additional energy sources present on your equipment and absent here.
Authorship and validation
This example was authored by Setyr for domain validation. It is not derived from any customer's controlled documents. It illustrates the elements 29 CFR 1910.147(c)(4)(ii) requires a procedure to contain — it does not certify compliance, which is a property of an employer's programme rather than of any document.